Properties of electrodeposited Co-Mn films: Influence of deposition parameters

dc.contributor.authorKarpuz, Ali
dc.contributor.authorKöçkar, Hakan
dc.contributor.buuauthorAlper, Mürsel
dc.contributor.departmentUludağ Üniversitesi/Fen Edebiyat Fakültesi/Fizik Bölümü.tr_TR
dc.contributor.researcheridAAG-8795-2021tr_TR
dc.contributor.scopusid7005719283tr_TR
dc.date.accessioned2023-11-02T07:40:08Z
dc.date.available2023-11-02T07:40:08Z
dc.date.issued2015-12-30
dc.descriptionBu çalışma, 05-07 Mart 2015 tarihleri arasında Brasov[Romanya]’da düzenlenen 9. International Conference on Materials Science and Engineering (BRAMAT)’da bildiri olarak sunulmuştur.tr_TR
dc.description.abstractCo-Mn films were produced with electrodeposition considering the deposition parameters of electrolyte pH value, Mn concentration of the electrolyte and film thickness. The effect of each parameter on the structural, magnetic and magnetoresistance properties of the films was studied, separately. X-ray diffraction measurement showed that the films have hexagonal close packed structure. For the films deposited at different pH values, the surface morphologies with different-sized globular granules were observed whereas the morphology covered by uniformly distributed nanoscale grains was detected for the surfaces of all films produced from electrolytes with different Mn concentrations. Also, the ribbed surfaces for 6 mu m and 4 mu m, and the nano-sized acicular surface morphologies for 2 mu m were observed. To the results of magnetic measurements, the saturation magnetization was found to be 1230 emu/cm(3) for all films deposited at different electrolyte pHs. The highest remanent magnetization value was obtained to be 882 emu/cm(3) for the film produced from the electrolyte containing 0.06 M Mn concentration. The coercivity, H-c, values decreased from 147 Oe to 43 Oe when the electrolyte pH decreased from 4.7 to 2.6. And, the Hc continued to decrease from 45 Oe to 31 Oe when the Mn concentration increased from 0.02 M to 0.06 M, and from 27 Oe to 22 Oe when the film thickness decreased from 6 pin to 2 mu m. It is seen that the Hc was immensely affected by the deposition parameters applied during the film production. The Co-Mn films with low Hc were achieved using relatively low electrolyte pH, high Mn concentration of electrolyte and low film thickness, respectively. Also, influence of the deposition parameters affect Hc is in order of the electrolyte pH, the Mn concentration in the electrolyte and the film thickness (from high to low influence). As it is observed that the magnetic properties are sensible to the deposition parameters and the Co-Mn films may have the potential applications in magnetic recording and sensors technologies.en_US
dc.identifier.citationKarpuz, A. vd. (2015). "Properties of electrodeposited Co-Mn films: Influence of deposition parameters". Applied Surface Science, 358(Part B), 605-611.en_US
dc.identifier.endpage611tr_TR
dc.identifier.issn0169-4332
dc.identifier.issuePart Ben_US
dc.identifier.scopus2-s2.0-84940706625tr_TR
dc.identifier.startpage605tr_TR
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2015.08.179
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0169433215020036
dc.identifier.urihttp://hdl.handle.net/11452/34752
dc.identifier.volume358tr_TR
dc.identifier.wos000366220500014
dc.indexed.scopusScopusen_US
dc.indexed.wosSCIEen_US
dc.indexed.wosCPCISen_US
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.collaborationYurt içitr_TR
dc.relation.journalApplied Surface Scienceen_US
dc.relation.publicationcategoryKonferans Öğesi - Uluslararasıtr_TR
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectChemistryen_US
dc.subjectMaterials scienceen_US
dc.subjectPhysicsen_US
dc.subjectMagnetic-propertiesen_US
dc.subjectNi-Coen_US
dc.subjectInplane anisotropyen_US
dc.subjectAlloysen_US
dc.subjectGrowthen_US
dc.subjectElectrolytesen_US
dc.subjectPerformanceen_US
dc.subjectPotentialsen_US
dc.subjectThicknessen_US
dc.subjectRotationen_US
dc.subjectBinary alloysen_US
dc.subjectCobalt alloysen_US
dc.subjectElectrodepositionen_US
dc.subjectElectrodesen_US
dc.subjectElectrolytesen_US
dc.subjectFilm thicknessen_US
dc.subjectMagnetic propertiesen_US
dc.subjectMorphologyen_US
dc.subjectpHen_US
dc.subjectSaturation magnetizationen_US
dc.subjectSurface morphologyen_US
dc.subjectX ray diffractionen_US
dc.subjectDeposition parametersen_US
dc.subjectFilm productionen_US
dc.subjectHexagonal close packed structureen_US
dc.subjectMagnetoresistance propertiesen_US
dc.subjectMn concentrationsen_US
dc.subjectRemanent magnetizationen_US
dc.subjectStructural characterizationen_US
dc.subjectX-ray diffraction measurementsen_US
dc.subjectManganese alloysen_US
dc.subjectCo-Mn alloysen_US
dc.subject.scopusIron; Cobalt alloys; Magnetic propertiesen_US
dc.subject.wosChemistry, physicalen_US
dc.subject.wosMaterials science, coatings & filmsen_US
dc.subject.wosPhysics, applieden_US
dc.subject.wosPhysics, condensed matteren_US
dc.titleProperties of electrodeposited Co-Mn films: Influence of deposition parametersen_US
dc.typeArticle
dc.typeProceedings Paper
dc.wos.quartileQ2en_US
dc.wos.quartileQ1en_US

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