Electrochemical, structural and magnetic analysis of electrodeposited CoCu/Cu multilayers: Influence of Cu layer deposition potential

dc.contributor.authorKoçkar, Hakan
dc.contributor.authorKuru, Hilal
dc.contributor.authorÜnlü, Cumhur Gökhan
dc.contributor.buuauthorTekgül, Atakan
dc.contributor.buuauthorAlper, Mursel
dc.contributor.departmentUludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.tr_TR
dc.contributor.orcid0000-0001-6737-3838tr_TR
dc.contributor.researcheridP-2124-2016tr_TR
dc.contributor.researcheridAAG-8795-2021tr_TR
dc.contributor.scopusid37462175100tr_TR
dc.contributor.scopusid7005719283tr_TR
dc.date.accessioned2023-09-26T10:28:11Z
dc.date.available2023-09-26T10:28:11Z
dc.date.issued2018-03
dc.description.abstractThe electrochemical, structural and magnetic properties of CoCu/Cu multilayers electrodeposited at different cathode potentials were investigated from a single bath. The Cu layer deposition potentials were selected as , and with respect to saturated calomel electrode (SCE) while the Co layer deposition potential was constant at versus SCE. For the electrochemical analysis, the current-time transients were obtained. The amount of noble non-magnetic (Cu) metal materials decreased with the increase of deposition potentials due to anomalous codeposition. Further, current-time transient curves for the Co layer deposition and capacitance were calculated. In the structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The (111) peak shifts towards higher angle with the increase of the deposition potentials. Also, the lattice parameters of the multilayers decrease from 0.3669 nm to 0.3610 nm with the increase of the deposition potentials from to , which corresponds to the bulk values of Cu and Co, respectively. The electrochemical and structural results demonstrate that the amount of Co atoms increased and the Cu atoms decreased in the layers with the increase of deposition potentials due to anomalous codeposition. For magnetic measurements, the saturation magnetizations, obtained from the magnetic curves of the multilayers were obtained as 212 kA/m, 276 kA/m, and 366 kA/m with , , and versus SCE, respectively. It is seen that the values increased with the increase of the deposition potentials confirming the increase of the Co atoms and decrease of the Cu amount. The results of electrochemical and structural analysis show that the deposition potentials of non-magnetic layers plays important role on the amount of magnetic and non-magnetic materials in the layers and thus on the magnetic properties of the multilayers.en_US
dc.description.sponsorshipTürkiye Cumhuriyeti Kalkınma Bakanlığı - 2005K120170tr_TR
dc.identifier.citationTekgül, A. vd. (2018). ''Electrochemical, structural and magnetic analysis of electrodeposited CoCu/Cu multilayers: Influence of Cu layer deposition potential''. Journal of Electronic Materials, 47(3), 1896-1903.en_US
dc.identifier.endpage1903tr_TR
dc.identifier.issn0361-5235
dc.identifier.issn1543-186X
dc.identifier.issue3tr_TR
dc.identifier.scopus2-s2.0-85037647322tr_TR
dc.identifier.startpage1896tr_TR
dc.identifier.urihttps://doi.org/10.1007/s11664-017-5984-9
dc.identifier.urihttps://link.springer.com/article/10.1007/s11664-017-5984-9
dc.identifier.urihttp://hdl.handle.net/11452/34054
dc.identifier.volume47tr_TR
dc.identifier.wos000424341700017
dc.indexed.wosSCIEen_US
dc.language.isoenen_US
dc.publisherSpringeren_US
dc.relation.bapUAP(F)-2010/56tr_TR
dc.relation.collaborationYurt içitr_TR
dc.relation.journalJournal of Electronic Materialsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergitr_TR
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectEngineeringen_US
dc.subjectMaterials scienceen_US
dc.subjectPhysicsen_US
dc.subjectCoCu/Cu multilayeren_US
dc.subjectElectrodepositionen_US
dc.subjectAnomalous codepositionen_US
dc.subjectElectrochemical propertiesen_US
dc.subjectStructural propertiesen_US
dc.subjectMagnetic propertiesen_US
dc.subjectCO-CU/CU multilayersen_US
dc.subjectGiant magnetoresistanceen_US
dc.subjectThin-filmsen_US
dc.subjectGrowthen_US
dc.subjectThicknessesen_US
dc.subjectEvolutionen_US
dc.subjectAtomsen_US
dc.subjectCobalten_US
dc.subjectCorrosionen_US
dc.subjectDepositionen_US
dc.subjectElectrochemical propertiesen_US
dc.subjectElectrodepositionen_US
dc.subjectElectrodesen_US
dc.subjectMagnetic materialsen_US
dc.subjectMagnetic propertiesen_US
dc.subjectMagnetismen_US
dc.subjectMultilayersen_US
dc.subjectPower qualityen_US
dc.subjectStructural analysisen_US
dc.subjectStructural propertiesen_US
dc.subjectAnomalous codepositionen_US
dc.subjectCo-Cu/Cu multilayersen_US
dc.subjectCurrent-time transienten_US
dc.subjectElectrochemical analysisen_US
dc.subjectFace centered cubic structureen_US
dc.subjectNon-magnetic materialsen_US
dc.subjectSaturated calomel electrodeen_US
dc.subjectStructural and magnetic propertiesen_US
dc.subjectMagnetic multilayersen_US
dc.subject.scopusCopper; Coercivity; Saturation Magnetizationen_US
dc.subject.wosEngineering, electrical & electronicen_US
dc.subject.wosMaterials science, multidisciplinaryen_US
dc.subject.wosPhysics, applieden_US
dc.titleElectrochemical, structural and magnetic analysis of electrodeposited CoCu/Cu multilayers: Influence of Cu layer deposition potentialen_US
dc.typeArticle
dc.wos.quartileQ3en_US

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