Effect of Co and Cu layer thicknesses on characterization of electrodeposited Co/Cu multilayers

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dc.contributor.authorKoçkar, Hakan
dc.contributor.buuauthorHacıismailoğlu, Mürşide Şafak
dc.contributor.buuauthorAlper, Mürsel
dc.contributor.departmentUludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Anabilim Dalı.tr_TR
dc.contributor.orcid0000-0001-5648-3230tr_TR
dc.contributor.researcheridAAG-8795-2021tr_TR
dc.contributor.researcheridAAH-9719-2021tr_TR
dc.contributor.scopusid36482867500tr_TR
dc.contributor.scopusid7005719283tr_TR
dc.date.accessioned2023-05-12T11:40:55Z
dc.date.available2023-05-12T11:40:55Z
dc.date.issued2013-01
dc.description.abstractCo/Cu multilayers were grown on polycrystalline Cu substrates from a single electrolyte by electrodeposition potentiostatically. The structural, magnetic and magnetoresistance (MR) properties of the multilayers were characterized according to both Co and Cu layer thicknesses. The structural analysis by X-ray diffraction (XRD) showed that all samples have face-centered cubic (fcc) structure with a strong (100) texture. Magnetic characterizations studied by vibrating sample magnetometer (VSM) revealed that the easy axes of the multilayers are parallel to the film plane. From magnetoresistance (MR) measurements, it was observed that all samples exhibited giant magnetoresistance (GMR). The GMR behavior of the multilayers changes depending on the thicknesses of both Co and Cu layers.en_US
dc.description.sponsorshipTürkiye Cumhuriyeti Kalkınma Bakanlığı - (2005K120170)tr_TR
dc.description.sponsorshipAnadolu Üniversitesitr_TR
dc.identifier.citationHacıismailoğlu, M. Ş. vd. (2013). “Effect of Co and Cu layer thicknesses on characterization of electrodeposited Co/Cu multilayers”. Sensor Letters, 11(1), Special Issue, 106-109.en_US
dc.identifier.endpage109tr_TR
dc.identifier.issn1546-198X
dc.identifier.issn1546-1971
dc.identifier.issue1, Special Issueen_US
dc.identifier.scopus2-s2.0-84877982043tr_TR
dc.identifier.startpage106tr_TR
dc.identifier.urihttps://doi.org/10.1166/sl.2013.2798
dc.identifier.urihttp://hdl.handle.net/11452/32648
dc.identifier.volume11tr_TR
dc.identifier.wos000321593400026
dc.indexed.scopusScopusen_US
dc.indexed.wosSCIEen_US
dc.language.isoenen_US
dc.publisherAmer Scientific Publishersen_US
dc.relation.collaborationYurt içitr_TR
dc.relation.journalSensor Lettersen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergitr_TR
dc.relation.tubitakTBAG-1771tr_TR
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectChemistryen_US
dc.subjectElectrochemistryen_US
dc.subjectInstruments & instrumentationen_US
dc.subjectPhysicsen_US
dc.subjectElectrodepositionen_US
dc.subjectGiant magnetoresistanceen_US
dc.subjectMultilayersen_US
dc.subjectX ray diffractionen_US
dc.subjectCo/Cu multilayersen_US
dc.subjectFace centered cubic structureen_US
dc.subjectGiant magnetoresistances (GMR)en_US
dc.subjectGMRen_US
dc.subjectMagnetoresistance measurementsen_US
dc.subjectMagnetoresistance propertiesen_US
dc.subjectVibrating sample magnetometeren_US
dc.subjectVSMen_US
dc.subjectMagnetic multilayersen_US
dc.subjectSuperlatticesen_US
dc.subject.scopusCopper; Coercivity; Saturation Magnetizationen_US
dc.subject.wosChemistry, analyticalen_US
dc.subject.wosElectrochemistryen_US
dc.subject.wosInstruments & instrumentationen_US
dc.subject.wosPhysics, applieden_US
dc.titleEffect of Co and Cu layer thicknesses on characterization of electrodeposited Co/Cu multilayersen_US
dc.typeArticle

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