Preparation and characterisation of electrodeposited Ni-Cu/Cu multilayers

dc.contributor.authorBaykul, M.Celalettin
dc.contributor.authorPeter, Laszlo
dc.contributor.authorToth, J.
dc.contributor.authorBakonyi, I.
dc.contributor.buuauthorAlper, Mürsel
dc.contributor.departmentUludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.tr_TR
dc.contributor.researcheridAAG-8795-2021tr_TR
dc.contributor.scopusid7005719283tr_TR
dc.date.accessioned2021-08-23T07:58:08Z
dc.date.available2021-08-23T07:58:08Z
dc.date.issued2004-08
dc.description.abstractNi-Cu/Cu multilayers have been, grown from a single electrolyte under potentiostatic conditions at different electrolyte pH values. The current-time transients recorded during deposition indicated different growth modes of the Ni-Cu layers. Structural characterisation by X-ray diffraction revealed that the multilayers have the same crystal structure and texture as their ( 1 0 0) textured polycrystalline Cu substrate. Scanning electron microscopy showed that the films grown at low pH (2.2) have smoother surfaces than those grown at high pH (3.0). Energy dispersive X-ray analysis revealed that the magnetic layers of the multilayers electrodeposited at high pH contain much more Cu compared to those deposited at low pH. Anisotropic magnetoresistance was found for nominal Cu layer thicknesses below 0.6 nm, and giant magnetoresistance (GMR) above 0.6 nm. The shape of the magnetoresistance curves for GMR multilayers indicated the predominance of a superparamagnetic contribution, possibly due to the discontinuous nature of the magnetic layer. For multilayers with the same bilayer and total thicknesses, the GMR magnitude decreased as the electrolyte pH increased. Besides possible structural differences, this may have come from a strong increase in the Cu content of the magnetic layers since this causes a nearly complete loss of ferromagnetism at room temperature.en_US
dc.identifier.citationAlper, M. vd. (2004). “Preparation and characterisation of electrodeposited Ni-Cu/Cu multilayers”. Journal of Applied Electrochemistry, 34(8), 841-848.en_US
dc.identifier.endpage848tr_TR
dc.identifier.issn0021-891X
dc.identifier.issue8tr_TR
dc.identifier.scopus2-s2.0-3242792528tr_TR
dc.identifier.startpage841tr_TR
dc.identifier.urihttps://doi.org/10.1023/B:JACH.0000035608.49948.e8
dc.identifier.urihttps://link.springer.com/article/10.1023%2FB%3AJACH.0000035608.49948.e8
dc.identifier.urihttp://hdl.handle.net/11452/21516
dc.identifier.volume34tr_TR
dc.identifier.wos000222816400009tr_TR
dc.indexed.scopusScopusen_US
dc.indexed.wosSCIEen_US
dc.language.isoenen_US
dc.publisherSpringeren_US
dc.relation.collaborationYurt içitr_TR
dc.relation.collaborationYurt dışıtr_TR
dc.relation.journalJournal of Applied Electrochemistryen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergitr_TR
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectElectrodepositionen_US
dc.subjectElectrolyte pHen_US
dc.subjectGMRen_US
dc.subjectNi-Cu/Cu multilayersen_US
dc.subjectSuperparamagnetismen_US
dc.subjectPotential wave-formsen_US
dc.subjectGiant magnetoresistanceen_US
dc.subjectCo/Cu multilayersen_US
dc.subjectCu alloysen_US
dc.subjectAnisotropyen_US
dc.subjectCrystal structureen_US
dc.subjectSuperlatticesen_US
dc.subjectMicrostructureen_US
dc.subjectFilmsen_US
dc.subjectFerromagnetismen_US
dc.subjectMagnetoresistanceen_US
dc.subjectMultilayersen_US
dc.subjectpH effectsen_US
dc.subjectScanning electron microscopyen_US
dc.subjectX ray diffraction analysisen_US
dc.subjectAnisotropic magnetoresistanceen_US
dc.subjectElectrochemistryen_US
dc.subject.scopusGiant Magnetoresistance; Coercivity; Saturation Magnetizationen_US
dc.subject.wosElectrochemistryen_US
dc.titlePreparation and characterisation of electrodeposited Ni-Cu/Cu multilayersen_US
dc.typeArticle
dc.wos.quartileQ4en_US

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