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The effect and nature of the radiation induced oxide-interface traps on the performance of the Yb2O3 MOS device

dc.contributor.authorGürer, Umutcan
dc.contributor.authorYılmaz, Ercan
dc.contributor.buuauthorKahraman, Ayşegül
dc.contributor.departmentFen Edebiyat Fakültesi
dc.contributor.departmentFizik Bölümü
dc.contributor.orcid0000-0002-1836-7033
dc.contributor.researcheridAAH-6441-2021
dc.contributor.scopusid47161190600
dc.date.accessioned2023-10-26T12:41:01Z
dc.date.available2023-10-26T12:41:01Z
dc.date.issued2020-12
dc.description.abstractModifications in the crystal properties, chemical compositions and bond contents as a result of irradiation of Yb2O3/Si structures annealed at different temperatures in the dose range of 1-50 kGy were investigated. Beside, comprehensive results on the effect of the structural changes on radiation response of the MOS capacitors produced with these structures was presented in this study. 122 nm-thick Yb2O3 films were grown on p-type Si by RF magnetron sputtering, and the Yb2O3/Si structures were annealed at 200 degrees C, 400 degrees C, 600 degrees C, 800 degrees C under nitrogen ambient. The radiation exposure disrupts the crystalline properties of the film. Yb 4 d and O 1s spectra were taken from different depths in the Yb2O3/Si structures with X-ray photoelectron spectroscopy. Reasons of the right-side shift in the capacitance voltage (C-V) curves of the as-deposited and 200 degrees C-Yb2O3 MOS capacitors with radiation exposure were determined as increasing 2+ oxidation state occurring with the trapping of the electrons in the Yb3+ defect centers, decreasing Si-Si bond contents causing the positive charge trapping at Yb2O3/Si interface, existence of the hydrogen defect precursors. Events causing the left-side shift of the C-V with radiation exposure may be the silicate layer developing at the interface, increase in the trapping of the positive charges in the Si-Si defect centers, and decreasing Yb-Yb and 2+ contents. The radiation responses of the 400 degrees C, 600 degrees C, 800 degrees C-Yb2O3 MOS capacitors could not be measured at the frequencies lower than 2 MHz due to high charge trapping, high binding energies of the Yb-O and Yb3+ peaks, increasing 2+ oxidation content. The C-V curve shifted to the left-side at the relatively lower dose of 1 kGy for only device composed of 200 degrees C-Yb2O3 film. The sensitivities of the 200 degrees C-Yb2O3 MOS capacitor were found to be 16.3 mV/Gy for 70 Gy.
dc.description.sponsorshipTürkiye Cumhuriyeti Cumhurbaşkanlığı Strateji ve Bütçe Başkanlığı (2016K12-2834)
dc.identifier.citationKahraman, A. vd. (2020). "The effect and nature of the radiation induced oxide-interface traps on the performance of the Yb2O3 MOS device". Radiation Physics and Chemistry, 177.
dc.identifier.doi10.1016/j.radphyschem.2020.109135
dc.identifier.issn0969-806X
dc.identifier.scopus2-s2.0-85092642168
dc.identifier.urihttps://doi.org/10.1016/j.radphyschem.2020.109135
dc.identifier.urihttp://hdl.handle.net/11452/34599
dc.identifier.volume177
dc.identifier.wos000588314100031
dc.indexed.wosSCIE
dc.language.isoen
dc.publisherElsevier
dc.relation.journalRadiation Physics and Chemistry
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi
dc.relation.tubitak117R054
dc.relation.tubitakARDEB1001
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectChemistry
dc.subjectNuclear science & technology
dc.subjectPhysics
dc.subjectYtterbium compounds
dc.subjectCapacitance voltage
dc.subjectChemical compositions
dc.subjectCrystal properties
dc.subjectCrystalline properties
dc.subjectRadiation exposure
dc.subjectRadiation response
dc.subjectRadiation-induced
dc.subjectrf-Magnetron sputtering
dc.subjectBinding energy
dc.subjectCapacitance
dc.subjectCharge trapping
dc.subjectChemical modification
dc.subjectDielectric devices
dc.subjectInterface states
dc.subjectMagnetron sputtering
dc.subjectMOS capacitors
dc.subjectPhotoelectron spectroscopy
dc.subjectRadiation
dc.subjectSilicates
dc.subjectSilicon
dc.subjectX ray photoelectron spectroscopy
dc.subjectMOS
dc.subjectXPS
dc.subjectStructural modifications
dc.subjectSensor
dc.subjectHigh-k dielectrics
dc.subjectX Ray
dc.subjectIrradiation
dc.subject.emtreeHydrogen
dc.subject.emtreeMetal oxide
dc.subject.emtreeNitrogen
dc.subject.emtreeSilicon
dc.subject.emtreeUnclassified drug
dc.subject.emtreeYtterbium oxide
dc.subject.emtreeYtterbium
dc.subject.emtreeArticle
dc.subject.emtreeBinding energy
dc.subject.emtreeCapacitance voltage
dc.subject.emtreeChemical binding
dc.subject.emtreeChemical bond
dc.subject.emtreeChemical composition
dc.subject.emtreeChemical parameters
dc.subject.emtreeControlled study
dc.subject.emtreeCrystal structure
dc.subject.emtreeElectric potential
dc.subject.emtreeElectron
dc.subject.emtreeEnergy
dc.subject.emtreeMos capacitor
dc.subject.emtreeOxidation
dc.subject.emtreeOxide interface trap
dc.subject.emtreeRadiation
dc.subject.emtreeRadiation dose
dc.subject.emtreeRadiation exposure
dc.subject.emtreeRadio frequency magnetron sputtering
dc.subject.emtreeSurface property
dc.subject.emtreeTemperature
dc.subject.emtreeThickness
dc.subject.emtreeX ray photoemission spectroscopy
dc.subject.scopusDosimeters; MOSFET; Radiation
dc.subject.wosChemistry, physical
dc.subject.wosNuclear science & technology
dc.subject.wosPhysics, atomic, molecular & chemical
dc.titleThe effect and nature of the radiation induced oxide-interface traps on the performance of the Yb2O3 MOS device
dc.typeArticle
dc.wos.quartileQ3 (Chemistry, physical)
dc.wos.quartileQ1 (Neurosciences)
dc.wos.quartileQ2 (Physics, atomic, molecular & chemical)
dspace.entity.typePublication
local.contributor.departmentFen Edebiyat Fakültesi/Fizik Bölümü
local.indexed.atScopus
local.indexed.atWOS

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