Publication:
Detailed transmittance analysis of high-performance SnO₂-doped WO₃thin films in UV-Vis region for electrochromic devices

dc.contributor.authorOlkun, Ali
dc.contributor.authorPat, Suat
dc.contributor.authorAkkurt, Nihan
dc.contributor.authorMohammadigharehbagh, Reza
dc.contributor.authorDemirkol, Uğur
dc.contributor.authorÖzgür, Mustafa
dc.contributor.authorKorkmaz, Şadan
dc.contributor.buuauthorOlkun, Ali
dc.contributor.departmentBursa Uludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.
dc.contributor.orcid0000-0003-0061-0573
dc.contributor.researcheridKVY-3644-2024
dc.date.accessioned2024-07-29T07:42:00Z
dc.date.available2024-07-29T07:42:00Z
dc.date.issued2020-09-18
dc.description.abstractWO(3)is a popular electrochromic device and therefore it has extensively used for the electrochromic (EC) devices such as display and smart window applications. In this study, SnO2-doped WO(3)thin films have been deposited to obtain high-performance EC device and detailed transmittance analysis was determined. At the end of this study, general coloring-bleaching mechanism for SnO2-doped WO(3)active layer is presented. Li ion intercalation/de-intercalation is seen in Nyquist graph for the SnO2-doped WO(3)thin film deposited onto ITO coated glass substrate. All tests were done in 80 s in coloring and bleaching of the SnO2-doped WO(3)layer. Reversibility values of the EC devices mounted in this study were calculated to be 79 and 90% for the device with ITO or FTO conductive layers, respectively. According to the morphological analysis, grain distribution on the surfaces defined as to be perfect. Thanks to Raman analyses, the SnO2-WO(3)phases are seen. Finally, the EC devices have been working in the UV-Vis region. As a result, to obtain the high-performance EC device, SnO2-doped WO(3)active layer is a good choice. TVA method is also proper technology to device manufacturing.
dc.description.sponsorshipEskişehir Osmangazi Üniversitesi - 201719041
dc.identifier.doi10.1007/s10854-020-04444-x
dc.identifier.endpage19084
dc.identifier.issn0957-4522
dc.identifier.issue21
dc.identifier.startpage19074
dc.identifier.urihttps://doi.org/10.1007/s10854-020-04444-x
dc.identifier.urihttps://link.springer.com/article/10.1007/s10854-020-04444-x
dc.identifier.urihttps://hdl.handle.net/11452/43506
dc.identifier.volume31
dc.identifier.wos000571132400005
dc.indexed.wosWOS.SCI
dc.language.isoen
dc.publisherSpringer
dc.relation.journalJournal of Materials Science-Materials in Electronics
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectWO₃ thin-films
dc.subjectOptical-properties
dc.subjectDeposition
dc.subjectGraphene
dc.subjectBehavior
dc.subjectGrowth
dc.subjectGlass
dc.subjectSnO₂
dc.subjectEngineering
dc.subjectMaterials science
dc.subjectPhysics
dc.titleDetailed transmittance analysis of high-performance SnO₂-doped WO₃thin films in UV-Vis region for electrochromic devices
dc.typeArticle
dspace.entity.typePublication

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