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Composition dependence of structural and magnetic properties of electrodeposited Co-Cu films

dc.contributor.authorKaraağaç, Öznur
dc.contributor.authorKoçkar, Hakan
dc.contributor.buuauthorAlper, Mürsel
dc.contributor.departmentFen Edebiyat Fakültesi
dc.contributor.departmentFizik Bölümü
dc.contributor.researcheridAAG-8795-2021
dc.contributor.scopusid7005719283
dc.date.accessioned2022-03-25T07:45:18Z
dc.date.available2022-03-25T07:45:18Z
dc.date.issued2010-12
dc.description.abstractThe structural and magnetic properties of Co-Cu films were studied in terms of Co content in the films. The surface morphology of the films showed that the film with the lowest Co content (3 wt. %) had dendritic structures, whereas the surface of the film containing the highest amount of Co (61 wt. %) was more uniform with acicular shapes in some parts. X-ray diffraction patterns of the films showed that their crystal structure is a mixture of dominantly face-centered cubic (fcc) and hexagonal close-packed phases. At the lowest Co content, separate fcc (111) peaks appear, whereas the increase of Co content converts the peaks to be a single broad Co-Cu peak. The vibrating sample magnetometer measurements revealed that the saturation magnetization increases and coercivity decreases due to the decrease of the grain size caused by the increase of the Co content in the film. The structural and magnetic properties of Co-Cu films can be tailored, since these properties are directly related to the ratio of Co to Cu in the film.
dc.description.sponsorshipBalıkesir Üniversitesi (BAP 2007/08)
dc.description.sponsorshipTurkiye Cumhuriyeti Kalkinma Bakanligi (2005K120170)
dc.identifier.citationKaraağaç, Ö. vd. (2010). "Composition dependence of structural and magnetic properties of electrodeposited Co-Cu films". IEEE Transactions on Magnetics, 46(12), 3973-3977.
dc.identifier.doi10.1109/TMAG.2010.2073479
dc.identifier.endpage3977
dc.identifier.issn0018-9464
dc.identifier.issue12
dc.identifier.scopus2-s2.0-78649798835
dc.identifier.startpage3973
dc.identifier.urihttps://doi.org/10.1109/TMAG.2010.2073479
dc.identifier.urihttps://ieeexplore.ieee.org/document/5565500
dc.identifier.urihttp://hdl.handle.net/11452/25341
dc.identifier.volume46
dc.identifier.wos000284842400002
dc.indexed.wosSCIE
dc.language.isoen
dc.publisherIEEE
dc.relation.collaborationYurt içi
dc.relation.journalIEEE Transactions on Magnetics
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi
dc.relation.tubitakTBAG-1771
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectCobalt alloys
dc.subjectElectrochemical process
dc.subjectMagnetic analysis
dc.subjectGiant magnetoresistance
dc.subjectFabrication
dc.subjectCopper
dc.subjectEngineering
dc.subjectPhysics
dc.subjectCrystal structure
dc.subjectDiffraction
dc.subjectMagnetic properties
dc.subjectMagnetism
dc.subjectMetallic films
dc.subjectSaturation magnetization
dc.subjectStructural properties
dc.subjectX ray diffraction
dc.subjectCo content
dc.subjectCoercivities
dc.subjectComposition dependence
dc.subjectCu films
dc.subjectDendritic structures
dc.subjectElectrochemical process
dc.subjectFace-centered cubic
dc.subjectGrain size
dc.subjectHexagonal close-packed
dc.subjectMagnetic analysis
dc.subjectStructural and magnetic properties
dc.subjectVibrating sample magnetometer
dc.subjectCobalt
dc.subject.scopusGiant Magnetoresistance; Coercivity; Saturation Magnetization
dc.subject.wosEngineering, electrical & electronic
dc.subject.wosPhysics, applied
dc.titleComposition dependence of structural and magnetic properties of electrodeposited Co-Cu films
dc.typeArticle
dc.wos.quartileQ2
dc.wos.quartileQ3 (Physics, applied)
dspace.entity.typePublication
local.contributor.departmentFen Edebiyat Fakültesi/Fizik Bölümü
local.indexed.atScopus
local.indexed.atWOS

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