Publication:
Electrodeposited CoFeCu films at high and low ph levels: Structural and magnetic properties

dc.contributor.authorKoçkar, Hakan
dc.contributor.authorÖzergin, Ercüment
dc.contributor.authorKaraağaç, Öznur
dc.contributor.authorAlper, Mürsel
dc.contributor.authorKuru, Hilal
dc.contributor.authorHacıismailoğlu, Mürside
dc.contributor.buuauthorALPER, MÜRSEL
dc.contributor.buuauthorŞAFAK HACIİSMAİLOĞLU, MÜRŞİDE
dc.contributor.departmentUludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü.
dc.contributor.orcid0000-0001-5648-3230
dc.contributor.researcheridAAH-9719-2021
dc.contributor.researcheridAAG-8795-2021
dc.date.accessioned2024-08-08T10:33:18Z
dc.date.available2024-08-08T10:33:18Z
dc.date.issued2015-04-01
dc.description.abstractCoFeCu films were electrodeposited at high and low pH, and their structural, magnetic and magnetoresistance properties were studied. Current-time transients were recorded to observe the proper deposition of the films. Crystal structure was displayed with X-ray diffraction. All films had a face centered cubic structure and the crystal structure was dominated by fcc-Co. The morphology and elemental composition of the films were determined by scanning electron microscope and energy dispersive X-ray spectroscopy, respectively. The surface of the film deposited at low pH has larger roundish shapes than that of the film deposited at high pH. The saturation magnetization increases from 1,210 to 1,413 emu/cm(3) and coercivity increases from 29 to 39 Oe as the electrolyte pH increases. All CoFeCu films showed anisotropic magnetoresistance. It is seen that electrolyte pH has an substantial affect on the morphological and magnetic properties of the films.
dc.description.sponsorshipBalıkesir Üniversitesi - BAP 2008/05
dc.description.sponsorshipTürkiye Cumhuriyeti Kalkınma Bakanlığı - 2005K120170
dc.description.sponsorshipBalıkesir Üniversitesi - BAP 2001/02 - 2005/18
dc.identifier.doi10.1007/s10854-014-2652-1
dc.identifier.endpage2094
dc.identifier.issn0957-4522
dc.identifier.issue4
dc.identifier.startpage2090
dc.identifier.urihttps://doi.org/10.1007/s10854-014-2652-1
dc.identifier.urihttps://link.springer.com/article/10.1007/s10854-014-2652-1
dc.identifier.urihttps://hdl.handle.net/11452/43810
dc.identifier.volume26
dc.identifier.wos000351166400015
dc.indexed.wosWOS.SCI
dc.language.isoen
dc.publisherSpringer
dc.relation.journalJournal of Materials Science-Materials in Electronics
dc.relation.tubitakTBAG-1771
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectGiant magnetoresistance
dc.subjectThickness dependence
dc.subjectAnisotropy
dc.subjectAlloy
dc.subjectPhysics, condensed matter
dc.subjectEngineering
dc.subjectMaterials science
dc.subjectPhysics
dc.titleElectrodeposited CoFeCu films at high and low ph levels: Structural and magnetic properties
dc.typeArticle
dspace.entity.typePublication
relation.isAuthorOfPublication15150d2c-46bb-429c-8b74-114d9b223008
relation.isAuthorOfPublication9f6f11a2-b093-46f7-8184-b9e3c7312d5f
relation.isAuthorOfPublication.latestForDiscovery15150d2c-46bb-429c-8b74-114d9b223008

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