Publication:
Comparison of Ni-Cu alloy films electrodeposited at low and high pH levels

dc.contributor.authorKoçkar, Hakan
dc.contributor.authorBaykul, Mevlana Celalettin
dc.contributor.buuauthorAlper, Mürsel
dc.contributor.buuauthorŞafak, Mürside
dc.contributor.departmentFen Edebiyat Fakültesi
dc.contributor.departmentFizik Bölümü
dc.contributor.researcheridAAG-8795-2021
dc.contributor.scopusid7005719283
dc.contributor.scopusid13613646100
dc.date.accessioned2021-11-09T07:28:07Z
dc.date.available2021-11-09T07:28:07Z
dc.date.issued2008-04-03
dc.description.abstractNi-Cu alloy films were potentiostatically electrodeposited from the electrolytes with low pH (2.0) and high pH (3.3) levels. The structural analysis of the films was carried out using the X-ray diffraction (XRD) and scanning electron microscopy (SEM) techniques. The XRD data showed that the crystal texture degree was different for the films grown at high pH and low pH. At high pH, the films have a strong (100) texture of the face-centred cubic (fcc) structure, while for the films at low pH the crystal planes are randomly oriented, as in a powder pattern of Cu (or Ni). The SEM studies revealed that the surface morphology of the films strongly depend on the electrolyte pH. Furthermore, the magnetic characteristics studied by a vibrating sample magnetometer (VSM) and magnetotransport properties were observed to be affected by the electrolyte pH. The differences observed in the magnetic and magnetotransport properties were attributed to the structural changes caused by the electrolyte pH.
dc.identifier.citationAlper, M. vd. (2008). ''Comparison of Ni-Cu alloy films electrodeposited at low and high pH levels''. Journal of Alloys and Compounds, 453(1-2), 15-19.
dc.identifier.endpage19
dc.identifier.issn0925-8388
dc.identifier.issue1-2
dc.identifier.scopus2-s2.0-40149100946
dc.identifier.startpage15
dc.identifier.urihttps://doi.org/10.1016/j.jallcom.2006.11.066
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0925838806018974
dc.identifier.urihttp://hdl.handle.net/11452/22591
dc.identifier.volume453
dc.identifier.wos000254899700006
dc.indexed.wosSCIE
dc.language.isoen
dc.publisherElsevier Science
dc.relation.collaborationYurt içi
dc.relation.journalJournal of Alloys and Compounds
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectNi-Cu films
dc.subjectElectrodeposition
dc.subjectXRD
dc.subjectSEM
dc.subjectMagnetoresistance
dc.subjectAnisotropic magnetoresistance
dc.subjectGiant magnetoresistance
dc.subjectCu/cu superlattices
dc.subjectMultilayers
dc.subjectNickel
dc.subjectChemistry
dc.subjectMaterials science
dc.subjectMetallurgy & metallurgical engineering
dc.subject.scopusGiant Magnetoresistance; Coercivity; Saturation Magnetization
dc.subject.wosChemistry, physical
dc.subject.wosMaterials science, multidisciplinary
dc.subject.wosMetallurgy & metallurgical engineering
dc.titleComparison of Ni-Cu alloy films electrodeposited at low and high pH levels
dc.typeArticle
dc.wos.quartileQ1 (Metallurgy & metallurgical engineering)
dc.wos.quartileQ2 (Materials science, multidisciplinary)
dc.wos.quartileQ3 (Chemistry, physical)
dspace.entity.typePublication
local.contributor.departmentFen Edebiyat Fakültesi/Fizik Bölümü
local.indexed.atScopus
local.indexed.atWOS

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