Publication: Frequency dependent gamma-ray irradiation response of Sm2O3 MOS capacitors
dc.contributor.author | Kaya, Şenol | |
dc.contributor.author | Yılmaz, Ercan | |
dc.contributor.author | Karaçalı, Hüseyin | |
dc.contributor.buuauthor | Kahraman, Ayşegül G. | |
dc.contributor.department | Uludağ Üniversitesi/Fen-Edebiyat Fakültesi/Fizik Bölümü. | tr_TR |
dc.contributor.orcid | 0000-0002-1836-7033 | tr_TR |
dc.contributor.researcherid | AAH-6441-2021 | tr_TR |
dc.contributor.scopusid | 47161190600 | tr_TR |
dc.date.accessioned | 2022-06-13T07:01:54Z | |
dc.date.available | 2022-06-13T07:01:54Z | |
dc.date.issued | 2015-09-01 | |
dc.description.abstract | The frequency dependent irradiation influences on Sm2O3 MOS capacitors have been investigated and possible use of Sm2O3 in MOS-based radiation sensor was discussed in this study. To examine their gamma irradiation response over a range of doses, the fabricated MOS capacitors were irradiated up to 30 grays. Capacitance-Voltage (C-V) measurements were recorded for various doses and the influences of irradiation were determined from the mid-gap and flat-band voltage shifts. In addition, the degradations of irradiation have been studied by impedance based leakage current-voltage (J-V) characteristics. The results demonstrate that J-V characteristics have not been significantly change by irradiation and implying that the excited traps have a minor effect on current for given dose ranges. However, the frequency of applied voltage during. the C-V measurements affects the irradiation response of devices, significantly. The variations on the electrical characteristics may be attributed to the different time dependency of acceptor and donor-like interface states. In spite of the variations on the device characteristics, low frequency measurements indicate that Sm2O3 is a potential candidate to be used as a dielectric layer in MOS based irradiation sensors. | en_US |
dc.description.sponsorship | Orta Doğu teknik Üniversitesi | tr_TR |
dc.description.sponsorship | Abant İzzet Baysal Üniversitesi (AİBÜ) | tr_TR |
dc.description.sponsorship | Abant İzzet Baysal Üniversitesi (BAP. 2014.03.02.706) | tr_TR |
dc.description.sponsorship | Türkiye Cumhuriyeti Kalkınma Bakanlığı (2012K120360) | tr_TR |
dc.identifier.citation | Kaya, S. vd. (2015). "Frequency dependent gamma-ray irradiation response of Sm2O3 MOS capacitors". Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 358, 188-193. | tr_TR |
dc.identifier.endpage | 193 | tr_TR |
dc.identifier.issn | 0168-583X | |
dc.identifier.scopus | 2-s2.0-84934783588 | tr_TR |
dc.identifier.startpage | 188 | tr_TR |
dc.identifier.uri | https://doi.org/10.1016/j.nimb.2015.06.037 | |
dc.identifier.uri | https://www.sciencedirect.com/science/article/pii/S0168583X15005741 | |
dc.identifier.uri | http://hdl.handle.net/11452/27079 | |
dc.identifier.volume | 358 | tr_TR |
dc.identifier.wos | 000359170800030 | |
dc.indexed.scopus | Scopus | en_US |
dc.indexed.wos | SCIE | en_US |
dc.language.iso | en | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.collaboration | Yurt içi | tr_TR |
dc.relation.collaboration | Sanayi | tr_TR |
dc.relation.journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | en_US |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi | tr_TR |
dc.rights | info:eu-repo/semantics/closedAccess | en_US |
dc.subject | Interface states | en_US |
dc.subject | Irradiation effects | en_US |
dc.subject | Oxide trapped charges | en_US |
dc.subject | Sm2O3 MOS capacitors | en_US |
dc.subject | Interface-trap density | en_US |
dc.subject | Electrical characteristics | en_US |
dc.subject | Series resistance | en_US |
dc.subject | Thin-films | en_US |
dc.subject | Substrate | en_US |
dc.subject | Oxides | en_US |
dc.subject | Dielectrics | en_US |
dc.subject | States | en_US |
dc.subject | Layer | en_US |
dc.subject | Instruments & instrumentation | en_US |
dc.subject | Nuclear science & technology | en_US |
dc.subject | Physics | en_US |
dc.subject | Capacitance | en_US |
dc.subject | Capacitors | en_US |
dc.subject | Dielectric devices | en_US |
dc.subject | Gamma rays | en_US |
dc.subject | Interface states | en_US |
dc.subject | Irradiation | en_US |
dc.subject | Samarium compounds | en_US |
dc.subject | Capacitance voltage measurements | en_US |
dc.subject | Device characteristics | en_US |
dc.subject | Electrical characteristic | en_US |
dc.subject | Flat-band voltage shift | en_US |
dc.subject | Gamma-ray irradiation | en_US |
dc.subject | Irradiation effect | en_US |
dc.subject | Low frequency measurements | en_US |
dc.subject | Oxide trapped charge | en_US |
dc.subject | MOS capacitors | en_US |
dc.subject.scopus | Schottky Diodes; Thermionic Emission; Electrical Properties | en_US |
dc.subject.wos | Instruments & instrumentation | en_US |
dc.subject.wos | Nuclear science & technology | en_US |
dc.subject.wos | Physics, atomic, molecular & chemical | en_US |
dc.subject.wos | Physics, nuclear | en_US |
dc.title | Frequency dependent gamma-ray irradiation response of Sm2O3 MOS capacitors | en_US |
dc.type | Article | |
dc.wos.quartile | Q2 (Instruments & instrumentation) | en_US |
dc.wos.quartile | Q1 (Nuclear science & technology) | en_US |
dc.wos.quartile | Q3 | en_US |
dspace.entity.type | Publication |
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