The effect of ferromagnetic and non-ferromagnetic layer thicknesses on the electrodeposited CoFe/Cu multilayers

Abstract

A series of CoFe/Cu multilayer was electrodeposited as a function of ferromagnetic and non- ferromagnetic layer thicknesses on Ti substrates from a single electrolyte containing Co (from CoSO4), Fe (from FeSO4), Cu (from CuSO4) metal ions under potentiostatic control. The deposition was carried out in a three electrode cell at room temperature. The Cu and CoFe layers were deposited at a cathode potential of -0.3 and -1.5 V with respect to saturated calomel electrode respectively. The structural studies by X-ray diffraction revealed that the multilayers have face-centered-cubic structure. The magnetic characteristics of the films were investigated using a vibrating sample magnetometer and their easy-axis was found to be in the film plane. Magnetoresistance measurements were carried out at room temperature with magnetic fields up to +/- 955 kA/m using the Van der Pauw method. All multilayers exhibited giant magnetoresistance (GMR). The GMR values up to 22 % and a GMR sensitivity of 52 % per 1 kA/m were obtained.