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AKYILDIZ, HALİL İBRAHİM

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AKYILDIZ

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HALİL İBRAHİM

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    Evaluation of TiO 2 and ZnO atomic layer deposition coated polyamide 66 fabrics for photocatalytic activity and antibacterial applications
    (A V S Amer Inst Physics, 2021-03-01) Akyıldız, Halil İbrahim; Diler, Sümeyye; İslam, Shafiqul; AKYILDIZ, HALİL İBRAHİM; Diler, Sümeyye; İslam, Shafiqul; Bursa Uludağ Üniversitesi/Mühendislik Fakültesi/Tekstil Mühendisliği Bölümü,; 0000-0002-8727-5829; 0000-0002-8305-3719; 0000-0002-3290-1386; A-7660-2018; AAQ-2513-2021; GEJ-5342-2022
    Atomic layer deposition (ALD) is a versatile technique to functionalize textile substrates due to its ability to create conformal films on the fibers' surface. Photocatalytic activity and antibacterial activity of TiO2 and ZnO films deposited onto polyamide 66 fabrics were investigated. ALD coated fabrics were examined to eliminate Escherichia coli (E. coli) and Staphylococcus aureus (S. aureus) bacteria with ISO 20645 and AATCC 100 standard methods. Both materials were only slightly successful for the elimination of E. coli. However, ZnO films were more effective in killing S. aureus bacteria than TiO2 films independent of incubation conditions (i.e., under dark or ambient light). Deposited films were characterized using SEM, FTIR, UV-Vis, and XPS spectroscopy techniques. Furthermore, the samples' photocatalytic activity was determined by measuring methylene blue degradation as a model organic molecule showing that ZnO films were better photocatalysts as deposited. The films' antibacterial mechanism is mainly due to ions dissolving from the films into the bacterial solutions.
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    Immobilization of ZnO thin films onto fibrous glass substrates via atomic layer deposition and investigation of photocatalytic activity
    (Springer, 2021-09-20) İslam, Shafiqul; Akyıldız, Halil İbrahim; Islam, Shafiqul; AKYILDIZ, HALİL İBRAHİM; Bursa Uludağ Üniversitesi/Mühendislik Fakültesi/Tekstil Mühendisliği Bölümü.; 0000-0002-3290-1386; 0000-0002-8727-5829; AAQ-2513-2021; A-7660-2018
    Photocatalytic elimination of the toxic chemicals in water effluents is of interest as a green approach and surface area of the catalyst material is critical for high performance. Atomic layer deposition (ALD) provides a promising route to immobilize conformal thin film photocatalysts on the rough and high surface area substrates. In this study, very thin 10 nm of ZnO films were deposited on glass fabric substrate, and their photocatalytic activities were determined with and without post-processing annealing. After four hours of the solar simulator and UV lamp illuminations, the solutions with ZnO ALD films showed up to 97% degradation of the methylene blue in, faster than the films on planar substrates reported in the literature. With our proposed approach, a model contaminant is successfully cleaned quickly without the need to remove photocatalyst materials afterward. Reaction kinetics showed a first-order reaction for the photodegradation of the methylene blue in the presence of ZnO photocatalyst thin films. Structural and optical characterizations also showed that the defects play a significant role in the higher photocatalytic performance of the films explained by XRD, XPS, UV-Vis, and PL spectroscopy results.