Ertürk, Kadir2022-04-262022-04-262009-05Özer, M. vd. (2009). "Electrical, structural and morphological properties of Ni/n-Si contacts". Optoelectronics and Advanced Materials, Rapid Communications, 3(5), 506-508.1842-6573http://hdl.handle.net/11452/26094This paper presents structural, morphological and electrical properties of Ni/n-Si contacts formed by electro-deposition technique. Ni film is deposited on n-type Si (100) substrate using 2 mol/L Nickel Sulphamate, 0.5 mol/L Boric Acid solutions. The morphological properties are investigated by using energy dispersive X-Ray analysis and scanning electron microscopy imaging to perform local distribution of Ni. Electrical measurements have been done at room temperature to investigate the Schottky barrier height.eninfo:eu-repo/semantics/closedAccessElectro-depositionMorphological propertiesScanning electron microscopySchottky barrier heightHydrogenMaterials scienceOpticsBoric acidDepositionEnergy dispersive X ray analysisScanning electron microscopySchottky barrier diodesSemiconductor metal boundariesSiliconX ray diffraction analysisBoric acid solutionsElectrical measurementLocal distributionsMorphological propertiesNickel sulphamateSchottky barrier heightsSi (100) substrateStructural and morphological propertiesNickel metallographyArticle0002686223000252-s2.0-7795199230950650835Materials science, multidisciplinaryOpticsCatalysis; Born-Oppenheimer Approximation; Molecular Relaxation